Architects' Tech Alliance
Nov 8, 2026 · Industry Insights
China's KrF/I-Line Lithography Machines Achieve Commercial Mass Production Milestone
At the 2026 China International Import Expo, SMEE showcased its SSC800 (KrF 248nm) and SSB800 (I-line 365nm) dry lithography machines, which have achieved over 90% domestic component localization and entered commercial mass production for 110nm+ and 280nm+ process nodes respectively, supporting memory, power semiconductor, and analog chip manufacturing, though advanced EUV and ArF immersion tools for sub-14nm logic remain unmastered.
I-lineKrFSMEE
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